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Plasma reactor for PVD processes

A second chamber has been recently designed and built inside the Cluster lab which is totally dedicated to PVD processes. The chamber is equipped with two magnetron targets (diameters 2” and 4”, respectively), both powered with an RF generator. The reactor architecture gives the maximum flexibility to allow standard sputtering processes as well as more complex co-sputtering  depositions.

A peculiar feature of this chamber is the possibility to perform treatments or deposition of thin films on powder substrates. For this purpose we have designed and built a special sample holder capable of handling properly the powders during the deposition process, thereby permitting their most possible complete surface covering.